Pattern-induced magnetic anisotropy in FePt thin films by ion irradiation
Entity
UAM. Departamento de Física de la Materia CondensadaPublisher
American Physical SocietyDate
2011-03-23Citation
10.1103/PhysRevB.83.094422
Physical Review B 83.9 (2011): 094422
ISSN
1550-235X (online); 1098-0121 (print)DOI
10.1103/PhysRevB.83.094422Funded by
We gratefully acknowledge financial support from the Spanish Ministerio Ciencia e Innovacion through the project MAT2007-65420-C02-01 and Comunidad Autonoma de Madrid grant S2009/MAT-1467. MJ thanks Comunidad Autonoma de Madrid and CSIC Marina Bueno Program for their financial support. RS acknowledges the Spanish Ministry of Education and Science for a FPI research grant. JJ acknowledges the financial support from Linkoping University through the VR Linneaus grant LiLi-NFMProject
Gobierno de España. MAT2007-65420-C02-01; Comunidad de Madrid. S2009/MAT-1467/NANOOBJETOSEditor's Version
http://dx.doi.org/10.1103/PhysRevB.83.094422Subjects
FísicaRights
© 2011 American Physical SocietyAbstract
The magnetic properties of FePt thin films have been modified by exposing the samples to irradiation of 4 MeV Cl2+ ions. Patterned magnetic films, without modified topographical profile, were fabricated by irradiating the films through a shadowing micrometric mask. The structural changes, ascribed to the ion-beam-induced amorphization of the thin films, promote the modification of the magnetic anisotropy. In particular, the out-of-plane component of the magnetization decreases simultaneously with an enhancement of in-plane anisotropy by increasing ion fluence. Moreover, the nonirradiated regions present unexpected anisotropic behavior owing to the stray field of the irradiated regions. The control of this effect, which can have unwished consequences for the patterning of magnetic properties by ion bombardment, needs to be suitably addressed
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Google Scholar:Jaafar Ruiz-Castellanos, Miriam
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Sanz, R.
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McCord, J.
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Jensen, J.
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Schafer, R.
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Vázquez, M.
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Asenjo, A.
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