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Self-organized in-depth gradients in highly ti-doped zno films: thermal versus mw plasma annealing
Entity
UAM. Departamento de Física AplicadaPublisher
MDPIDate
2020-04-23Citation
10.3390/coatings10040418
Coatings 10.4 (2020): 418
ISSN
2079-6412 (online)DOI
10.3390/coatings10040418Funded by
We are thankful for funding from the Ministry of Science, Innovation and Universities of Spain, through grant CTQ2017-84309-C2-2-RProject
Gobierno de España. CTQ2017-84309-C2-2-REditor's Version
https://doi.org/10.3390/coatings10040418Subjects
Highly doped semiconductors; Zinc Oxide; Sol-gel; Bandgap; GI-XRF; FísicaRights
© 2020 by the authorsAbstract
Highly Ti-doped ZnO films have been produced by a spin-casting sol-gel process.
The spin-casted films show high in plane homogeneity and optical quality. However, when
inspected in depth, the surface composition is Ti rich. We show that two possible annealing processes
can be considered depending on the properties to exploit. To promote in-depth homogenization,
thermal annealing processes have been applied. Meanwhile, the gradients can be exacerbated, thanks
to a non-negligible surface sputtering, by applying microwave (MW) plasma treatments with Ar
discharges at different pressures. The microstructural properties of the differently processed films
have been obtained prior to a study by grazing incidence X-ray fluorescence (GI-XRF) spectroscopy,
which reveals the in-depth composition trends induced by the two alternative annealing procedures.
The final wetting, electrical and optical properties of the films are described in accordance with the Ti
distribution pattern revealed by GI-XRF. The study underlines for the first time how MW plasma
annealing processes can be used to exacerbate self-induced atomic gradients in sol-gel films with
potential implications in catalytic and biomedical applications
Files in this item
Google Scholar:Ramadan Shehata Ali, Rehab
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Fernández-Ruiz, Ramón
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Manso Silván, Miguel
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