Highly flexible method for the fabrication of photonic crystal slabs based on the selective formation of porous silicon
Entity
UAM. Departamento de Física AplicadaPublisher
Springer New YorkDate
2012-08-09Citation
10.1186/1556-276X-7-449
Nanoscale Research Letters 7 (2012): 449
ISSN
1931-7573 (print); 1556-276X (online)DOI
10.1186/1556-276X-7-449Funded by
The authors acknowledge Centro de Computación Científica (Universidad Autónoma de Madrid) for providing computational resources for numerical calculations. The authors also gratefully acknowledge funding from Comunidad de Madrid (Spain) under project ‘Microseres’ and Ministerio de Economía y Competitividad (Spain) under research project MAT2011-28345-C02-01.Editor's Version
http://dx.doi.org/10.1186/1556-276X-7-449Subjects
NanoPSi; Photonic band structure; Photonic slabs; Proton beam writing; FísicaRights
© 2012 Recio et al.Abstract
A novel fabrication method of Si photonic slabs based on the selective formation of porous silicon is reported. Free-standing square lattices of cylindrical air holes embedded in a Si matrix can be achieved by proton beam irradiation followed by electrochemical etching of Si wafers. The photonic band structures of these slabs show several gaps for the two symmetry directions for reflection through the z-plane. The flexibility of the fabrication method for tuning the frequency range of the gaps over the near- and mid-infrared ranges is demonstrated. This tunability can be achieved by simply adjusting the main parameters in the fabrication process such as the proton beam line spacing, proton fluence, or anodization current density. Thus, the reported method opens a promising route towards the fabrication of Si-based photonic slabs, with high flexibility and compatible with the current microelectronics industry
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Google Scholar:Recio-Sánchez, Gonzalo
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Dang, Zhiya
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Torres Costa, Vicente
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Breese, Mark B H
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Martín Palma, Raúl José
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