Understanding the intrinsic compression in polycrystalline films through a mean-field atomistic model
Entity
UAM. Departamento de Física de la Materia CondensadaPublisher
IOP PublishingDate
2020-11-17Citation
10.1088/1361-6463/abc11c
Journal of Physics D: Applied Physics 54.6 (2021): 065302
ISSN
0022-3727DOI
10.1088/1361-6463/abc11cProject
Gobierno de España. FIS2017-82415-R; Gobierno de España. PCI2019-103604; Gobierno de España. CEX2018-000805-MEditor's Version
https://doi.org/10.1088/1361-6463/abc11cSubjects
Stress and Mechanical Properties of Thin Films; Surfaces and Polycrystals; Growth and Surface Kinetics; Atomistic Modeling and Simulation; FísicaNote
This is the Accepted Manuscript version of an article accepted for publication in Journal of Physics D: Applied Physics. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at 10.1088/1361-6463/abc11cRights
© 2020 IOP Publishing Ltd
Esta obra está bajo una licencia de Creative Commons Reconocimiento-NoComercial-CompartirIgual 4.0 Internacional.
Files in this item
Google Scholar:Vasco, Enrique
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Ramírez-Peral, Mariá J.
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García Michel, Enrique
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Polop Jordá, Celia
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