Understanding the intrinsic compression in polycrystalline films through a mean-field atomistic model
Entidad
UAM. Departamento de Física de la Materia CondensadaEditor
IOP PublishingFecha de edición
2020-11-17Cita
10.1088/1361-6463/abc11c
Journal of Physics D: Applied Physics 54.6 (2021): 065302
ISSN
0022-3727DOI
10.1088/1361-6463/abc11cProyecto
Gobierno de España. FIS2017-82415-R; Gobierno de España. PCI2019-103604; Gobierno de España. CEX2018-000805-MVersión del editor
https://doi.org/10.1088/1361-6463/abc11cMaterias
Stress and Mechanical Properties of Thin Films; Surfaces and Polycrystals; Growth and Surface Kinetics; Atomistic Modeling and Simulation; FísicaNota
This is the Accepted Manuscript version of an article accepted for publication in Journal of Physics D: Applied Physics. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at 10.1088/1361-6463/abc11cDerechos
© 2020 IOP Publishing Ltd
Esta obra está bajo una licencia de Creative Commons Reconocimiento-NoComercial-CompartirIgual 4.0 Internacional.
Lista de ficheros
Google Scholar:Vasco, Enrique
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Ramírez-Peral, Mariá J.
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García Michel, Enrique
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Polop Jordá, Celia
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